Overview

This book is devoted to the physics of electron-beam, ion-beam, optical, and x-ray lithography. The need for this book results from the following considerations. The astonishing achievements in microelectronics are in large part connected with successfully applying the relatively new technology of processing (changing the prop­ erties of) a material into a device whose component dimensions are submicron, called photolithography. In this method the device is imaged as a pattern on a metal film that has been deposited onto a transparent substrate and by means of a broad stream of light is transferred to a semiconductor wafer within which the physical structure of the devices and the integrated circuit connections are formed layer by layer. The smallest dimensions of the device components are limited by the diffraction of the light when the pattern is transferred and are approximately the same as the wavelength of the light. Photolithography by light having a wavelength of A ~ 0.4 flm has made it possible to serially produce integrated circuits having devices whose minimal size is 2-3 flm in the 4 pattern and having 10-105 transistors per circuit.

Full Product Details

Author:   Kamil A. Valiev
Publisher:   Springer Science+Business Media
Imprint:   Kluwer Academic/Plenum Publishers
Edition:   1992 ed.
Dimensions:   Width: 17.80cm , Height: 2.50cm , Length: 25.40cm
Weight:   2.600kg
ISBN:  

9780306435782

ISBN 10:   0306435780
Pages:   493
Publication Date:   31 March 1992
Audience:   College/higher education ,  Professional and scholarly ,  Undergraduate ,  Postgraduate, Research & Scholarly
Format:   Hardback
Publisher's Status:   Active
Availability:   In Print  
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Table of Contents

1. Forming Electron Beams of Submicron Cross Section.- 2. The Physics of the Interactions between Fast Electrons and Matter.- 3. The Physics of Ion-Beam Lithography.- 4. The Physics of X-Ray Microlithography.- 5. Optical Lithography.- 6. Procedures for Processing Exposed Resist Films and Resist Mask Topography.

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