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Author:   Kash L. Mittal
Publisher:   Brill
Imprint:   VSP International Science Publishers
Weight:   0.793kg
ISBN:  

9789067643764

ISBN 10:   9067643769
Pages:   364
Publication Date:   01 March 2003
Audience:   College/higher education ,  Professional and scholarly ,  Undergraduate ,  Postgraduate, Research & Scholarly
Format:   Hardback
Publisher's Status:   Active
Availability:   In Print  
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Table of Contents

Preface Mapping of surface contaminants by tunable infrared-laser imaging D. Ottesen, S. Sickafoose, H. Johnsen, T. Kulp, K. Armstrong, S. Allendorf and T. Hoffard Monitoring cleanliness and defining acceptable cleanliness levels M.K. Chawla Tracking surface ionic contamination by ion chromatography B. Newton A new method using MESERAN technique for measuring surface contamination after solvent extraction M.G. Benkovich and J.L. Anderson Methods for pharmaceutical cleaning validations H.J. Kaiser Influence of cleaning on the surface of model glasses and their sensitivity to organic contamination W. Birch, S. Mechken and A. Carré Decontamination of sensitive equipment R. Kaiser and K. Haraldsen The fundamentals of no-chemistry process cleaning J.B. Durkee II Development of a technology for generation of ice particles D.V. Shishkin, E.S. Geskin and B. Goldenberg Cleaning with solid carbon dioxide pellet blasting F.C. Young Development of a generic procedure for modeling of waterjet cleaning K. Babets and E.S. Geskin Experimental and numerical investigation of waterjet derusting technology K. Babets, E.S. Geskin and B. Goldenberg Practical applications of icejet technology in surface processing D.V. Shishkin, E.S. Geskin and B. Goldenberg Correlating cleanliness to electrical performance T. Munson Qualifying a cleaning system for space flight printed wiring assemblies J.K. “Kirk” Bonner and A. Mehta Investigation of modified SC-1 solutions for silicon wafer cleaning C. Beaudry and S. Verhaverbeke Performance qualification of post-CMP cleaning equipment in a semiconductor fabrication environment M.T. Andreas Spatial and temporal scales in wet processing of deep submicrometer features M. Olim Microdenier fabrics for cleanroom wipers J. Skoufis and D.W. Cooper Fine particle detachment studied by reflectometry and atomic force microscopy Feiler and J. Ralston Dust removal from solar panels and spacecraft on Mars S. Trigwell, M.K. Mazumder, A.S. Biris, S. Anderson and C.U. Yurteri Laser cleaning of silicon wafers: Prospects and problems M. Mosbacher, V. Dobler, M. Bertsch, H.-J. Münzer, J. Boneberg and P. Leiderer Particle removal using resonant laser detachment K. Kearney and P. Hammond The future of industrial cleaning and related public policy-making C. LeBlanc

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