Overview

Since the introduction of silicides into the technology of electronic devices, they have been used continuously to form both ohmic and rectifying contacts to silicon. Silicides are also important for other applications, such as thermoelectric devices and structural applications. The 16th Course of the International School of Solid State Physics, held in 1999, was intended to break artificial barriers between disciplines, and to gather people concerned with the properties and applications of silicides, regardless of the formal fields to which they belong, or of the practical goals they pursue. This collection of the proceedings is therefore concerned with theory as well as applications, metallurgy as well as physics, and materials science as well as microelectronics.

Full Product Details

Author:   Francois D'heurle (Ibm, Yorktown Heights, Usa) ,  Leo Miglio (Univ Of Milano-bicocca, Italy)
Publisher:   World Scientific Publishing Co Pte Ltd
Imprint:   World Scientific Publishing Co Pte Ltd
Volume:   0
Dimensions:   Width: 16.20cm , Height: 2.80cm , Length: 22.40cm
Weight:   0.644kg
ISBN:  

9789810244521

ISBN 10:   9810244525
Pages:   388
Publication Date:   19 December 2000
Audience:   College/higher education ,  Professional and scholarly ,  Postgraduate, Research & Scholarly ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   Active
Availability:   Out of stock  
The supplier is temporarily out of stock of this item. It will be ordered for you on backorder and shipped when it becomes available.

Table of Contents

Crystal chemistry of metal silicides, R. Madar; bonding and polymorphism in transition metal disilicides, L. Miglio et al; diffusion in silicides - basic approach and practical applications, P. Gas and F.M. d'Heurle; silicides and thermodynamics, C. Bernard and A. Pisch; optical properties of silicides - theory and experiment, V. Antonov and F. Marabelli; fundamental electronic properties of semiconducting silicides, V. Borisenko; semiconducting silicides - thermoelectric properties and applications, A. Heinrich; metallic silicides, G. Ottaviani; the kinetics of reactive phase formation - silicides, F.M. d'Heurle; reactive phase formation in binary and tertiary silicide systems, A.A. Kodentsov et al; epitaxial silicides, H. Von Kanel; ion beam synthesis, molecular beam allotaxy and self-assembled patterning of epitaxial silicides, S. Mantl; silicides - materials science and applications for microelectronics, K. Maex and A. Lauwers; the changing views on the Schottky Barrier, R. Tung; metal rich structural silicides, A.J. Thom et al. (Part contents)

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