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OverviewSemiconductor Micromachining - Fundamentals and Technology - is a two volume work in which, for the first time, the various disciplines associated with the theory and practice of device fabrication are brought together in one comprehensive reference source. Volume 1 contains a detailed coverage of semiconductor electrochemistry and physics whilst Volume 2 describes the wide range of microengineering technologies with details of practical applications. The authors for each chapter have been carefully selected for their expertise and are acknowledged leaders in their respective fields. The purpose of this book is to enable workers in the area of semiconductor micromachining to have ready access to the basic literature, essential to provide a solid basis for the many different aspects of physics, chemistry, electronics and engineering involved with this technology. The main focus of the book is on structures based on silicon, the most common and versatile of the current range of commercially available semiconductors, but other materials such as III V semiconductors are also considered. Together these two volumes provide an indispensable reference text for this fast growing area of applied science. It will be of value to a wide range of academic and industrial scientists, technologists and engineers who wish to expand their knowledge in this area of science and for whom thus far, there has been no convenient reference work. Volume 2: Techniques and Industrial Applications Full Product DetailsAuthor: SA Campbell , H. J. LewerenzPublisher: John Wiley and Sons Ltd Imprint: John Wiley & Sons Ltd Edition: Volume 1 Dimensions: Width: 16.40cm , Height: 2.40cm , Length: 24.20cm Weight: 0.622kg ISBN: 9780471966814ISBN 10: 0471966819 Pages: 332 Publication Date: 24 February 1998 Audience: College/higher education , Professional and scholarly , Postgraduate, Research & Scholarly , Professional & Vocational Format: Hardback Publisher's Status: Out of Print Availability: In Print  Limited stock is available. It will be ordered for you and shipped pending supplier's limited stock. Table of ContentsVolume 1 Electrochemical and Photochemical Properties of Semiconductors S. Morrison Chemical and Electrochemical Etching of Semiconductors J. Kelly and D. Vanmaekelbergh Photoetching of III-V Semiconductors: Basic Photoelectrochemical Principles W. Plieth and S. Wetzenstein Influence of Photoelectrochemical Etching on Electronic Properties of Semiconductor Surfaces R. Tenne Surface Conditioning of Silicon by Photoelectrochemical Etching C. Levy-Clement Electrochemical Conditioning of Silicon: Surface Analyses and Electronic Implications H. Lewerenz and H. Jungblut The Formation of Porous Silicon D. Riley IndexReviewsAuthor InformationS. A. Campbell is the editor of Semiconductor Micromachining, Volume 1, Fundamental Electrochemistry and Physics, published by Wiley. H. J. Lewerenz is the editor of Semiconductor Micromachining, Volume 1, Fundamental Electrochemistry and Physics, published by Wiley. Tab Content 6Author Website:Countries AvailableAll regions |
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