Free Delivery Over $100
|
|
|||
|
||||
OverviewA one-stop reference for semiconductor principles and construction Semiconductor Micromachining is a two-volume set that coordinates the multidisciplinary nature of the field into a single comprehensive reference. Volume 1: Fundamental Electrochemistry and Physics builds a robust foundation of semiconductor concepts, and Volume 2: Techniques and Industrial Applications provides in-depth guidance on the practical aspects of the technology. Appropriate for graduate studies or scientists in academia and industry, this book provides a convenient reference for those who wish to expand their understanding of semiconductor technology. Full Product DetailsAuthor: S. A. Campbell , H. J. LewerenzPublisher: John Wiley and Sons Ltd Imprint: John Wiley & Sons Ltd Edition: Volumes 1 – 2 Dimensions: Width: 16.90cm , Height: 5.70cm , Length: 23.90cm Weight: 1.354kg ISBN: 9780471980841ISBN 10: 0471980846 Pages: 736 Publication Date: 27 March 1998 Audience: College/higher education , Professional and scholarly , Postgraduate, Research & Scholarly , Professional & Vocational Format: Hardback Publisher's Status: Out of Print Availability: In Print  Limited stock is available. It will be ordered for you and shipped pending supplier's limited stock. Table of ContentsVolume 1 Electrochemical and Photochemical Properties of Semiconductors S. Morrison Chemical and Electrochemical Etching of Semiconductors J. Kelly and D. Vanmaekelbergh Photoetching of III-V Semiconductors: Basic Photoelectrochemical Principles W. Plieth and S. Wetzenstein Influence of Photoelectrochemical Etching on Electronic Properties of Semiconductor Surfaces R. Tenne Surface Conditioning of Silicon by Photoelectrochemical Etching C. Levy-Clement Electrochemical Conditioning of Silicon: Surface Analyses and Electronic Implications H. Lewerenz and H. Jungblut The Formation of Porous Silicon D. Riley Index Volume 2 Anisotrophy and the Micromachining of Silicon A. Campbell, et al. Etch Stops S. Collins Photonic Integrated Circuits, Technology and Concepts R. Matz Monolithically Integrated Sensors for Mechanical Quantities in Standard CMOS Processing H. Offereins, et al. Silicon on Insulators C. Harendt and G. Roos Integrated Sensors and Actuators N. Najaft Smart Sensors N. Najaft and J. Moyne Anodic Oxidation of Silicon as a Low-Temperature Passivation Technique G. Mende Micromachined Optoelectronic Structures and Devices P. Deimel Wet and Dry Etching: A Comparison in the Context of Solid State Electronics Applications K. Bachmann IndexReviewsAuthor InformationS. A. Campbell is the editor of Semiconductor Micromachining, 2 Volume Set, published by Wiley. H. J. Lewerenz is the editor of Semiconductor Micromachining, 2 Volume Set, published by Wiley. Tab Content 6Author Website:Countries AvailableAll regions |
||||
