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OverviewThe focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored. Full Product DetailsAuthor: M. Sugawara (Professor, Professor, Hachinohe Institute of Technology, Japan)Publisher: Oxford University Press Imprint: Oxford University Press Volume: 7 Dimensions: Width: 16.30cm , Height: 2.30cm , Length: 24.20cm Weight: 0.743kg ISBN: 9780198562870ISBN 10: 019856287 Pages: 356 Publication Date: 28 May 1998 Audience: College/higher education , Tertiary & Higher Education Format: Hardback Publisher's Status: Active Availability: To order  Stock availability from the supplier is unknown. We will order it for you and ship this item to you once it is received by us. Table of Contents1: Introduction 2: RF discharges 3: Physical basis of plasma etching process 4: Diagnostics of plasma particles and potentials 5: Technology of reactive ion etching 6: Magnetic field coupled etchers 7: ECR plasma etchers 8: Future propects IndexReviewsAuthor InformationProfessor Minoru Sugawara, Hachinohe Institute of Technology, Hachinohe-city, Aomori 031, Japan. Fax: (0) 178 25 1430 Tab Content 6Author Website:Countries AvailableAll regions |
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