Free Delivery Over $100
|
|
|||
|
||||
OverviewFull Product DetailsAuthor: Efim Oks (High Current Electronics Institute, Russian Academy of Sciences, Tomsk, Russia)Publisher: Wiley-VCH Verlag GmbH Imprint: Blackwell Verlag GmbH Dimensions: Width: 17.50cm , Height: 1.40cm , Length: 24.60cm Weight: 0.482kg ISBN: 9783527406340ISBN 10: 3527406344 Pages: 181 Publication Date: 06 October 2006 Audience: Professional and scholarly , Professional & Vocational Format: Hardback Publisher's Status: Out of Print Availability: Awaiting stock  Table of ContentsReviewsIt is an up-to-date review and summary of this important subfield of applied plasma physics (Metall, February 2008) """It is an up-to-date review and summary of this important subfield of applied plasma physics"" (Metall, February 2008)" Author InformationEfim Oks is head scientist of the Plasma Sources Department at the High Current Electronics Institute, Russian Academy of Sciences, Russia. His work focuses on the twin areas of plasma cathode electron beam sources and vacuum arc ion beam sources and was awarded prestigiously. Professor Oks has established numerous collaborative scientific research programs with researchers in the United States and Europe. He thus has become a significant international plasma physicist, having authored numerous papers in international journals. Tab Content 6Author Website:Countries AvailableAll regions |
||||
