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OverviewOxide Thin Films provides an introduction to and review of oxide thin film physics, with an emphasis on experimental techniques. After a brief introductory chapter describing the unique properties of oxides, the first part of the book is devoted to the most common techniques used in the deposition and formation of oxide thin films, including sputtering, MOCVD, MBE, and PLD. The next two parts discuss the variety of methods used in the structural and physical characterization of thin films, from basic x-ray diffraction to near field microscopy, TEM, and neutron diffraction. The final section reviews the technological applications of oxide thin films. Full Product DetailsAuthor: Wilfred Prellier (Laboratoire Crismat Cnrs Umr 6508 France)Publisher: Taylor & Francis Inc Imprint: Taylor & Francis Inc ISBN: 9781420012231ISBN 10: 1420012231 Pages: 895 Publication Date: 01 June 2009 Audience: General/trade , General Format: Loose-leaf Publisher's Status: Active Availability: Out of stock  The supplier is temporarily out of stock of this item. It will be ordered for you on backorder and shipped when it becomes available. Table of ContentsReviewsAuthor InformationTab Content 6Author Website:Countries AvailableAll regions |
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