New Trend in Applied Plasma Science and Technology

Author:   Akira Kobayashi ,  Josef Krasa ,  Takeshi Miyasaka
Publisher:   American Institute of Physics
Volume:   1282
ISBN:  

9780735408128


Pages:   152
Publication Date:   10 December 2010
Format:   Hardback
Availability:   In Print   Availability explained
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New Trend in Applied Plasma Science and Technology


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Overview

The topics of International Symposium on Applied Plasma Science (ISAPS) focus mainly on plasma applications, such as plasma materials processing, plasma propulsions, and energy applications, including applications in microelectronics and application to environmental problems, as well as applications of other high-energy sources. Authors in this proceedings cover a wide range of interdisciplinary scientific activities in the fields of energy, mechanical, electrical, material, and chemical sciences.

Full Product Details

Author:   Akira Kobayashi ,  Josef Krasa ,  Takeshi Miyasaka
Publisher:   American Institute of Physics
Imprint:   American Institute of Physics
Volume:   1282
Dimensions:   Width: 21.60cm , Height: 1.50cm , Length: 27.70cm
Weight:   0.640kg
ISBN:  

9780735408128


ISBN 10:   0735408122
Pages:   152
Publication Date:   10 December 2010
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   Active
Availability:   In Print   Availability explained
This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us.

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