Low Temperature Plasmas: Fundamentals, Technologies and Techniques

Author:   Rainer Hippler ,  Holger Kersten ,  Martin Schmidt ,  Karl H. Schoenbach
Publisher:   Wiley-VCH Verlag GmbH
Edition:   2nd Edition
ISBN:  

9783527406739


Pages:   945
Publication Date:   23 January 2008
Format:   Hardback
Availability:   In stock   Availability explained
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Low Temperature Plasmas: Fundamentals, Technologies and Techniques


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Author:   Rainer Hippler ,  Holger Kersten ,  Martin Schmidt ,  Karl H. Schoenbach
Publisher:   Wiley-VCH Verlag GmbH
Imprint:   Wiley-VCH Verlag GmbH
Edition:   2nd Edition
Dimensions:   Width: 17.60cm , Height: 5.60cm , Length: 24.30cm
Weight:   2.020kg
ISBN:  

9783527406739


ISBN 10:   3527406735
Pages:   945
Publication Date:   23 January 2008
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   Active
Availability:   In stock   Availability explained
We have confirmation that this item is in stock with the supplier. It will be ordered in for you and dispatched immediately.

Table of Contents

Characteristics of low-temperature plasmas under non-thermal conditions, a short summary Electron kinetics in weakly ionized plasmas Elementary collision processes in plasmaS Fundamental processes of plasma-surface interactions Modelling of plasma-wall Interaction NEW Fundamentals of Dusty Plasmas (Melzer, Goree) NEW Plasmas under microgravity NEW Nucleation and growth of dust particles in low pressure cold plasmas (Boufendi) Langmuir probe diagnostics of low-temperature plasmas Diagnostics of non-equilibrium molecular plasmas using emission and absorption spectroscopy Mass spectrometric diagnostics NEW Cross-Correlation Spectroscopy of Non-Thermal Gas Discharges at Atmospheric Pressure Ellipsometric analysis of plasma-treated surfaces Characterization of thin solid films Plasma sources Reactive non-thermal plasmas - chemical quasi-equilibria, similarity principles and macroscopic kinetics High pressure plasmas: dielectric-barrier and corona discharges - properties and technical applications NEW Atmospheric Pressure Glow discharges NEW High-Pressure Microdischarges Transient plasma-assisted diesel exhaust remediation NEW Transient Plasma Ignition Plasma display panel Low pressure discharge light sources High-pressure plasma light sources Plasma etching in microelectronics Low temperature plasmas for polymer surface modification NEW EUV Lamps NEW Plasma etching in microelectronics NEW Magnetron discharges for Thin Film Deposition NEW Hollow Cathodes and plasma jetzs for thin film deposition NEW Low-temperature plasmas for polymer surface modification Plasma-enhanced deposition of superhard thin films NEW Applications of Dusty plasmas NEW Cold Plasma-Based Sterilization NEW Plasmas for Sterilization II NEW Cold gas plasmas in biology and medicine Markets for plasma technology

Reviews

... it makes a highly valuable contribution to the subject area and will be accessible to scientists and engineers working in the field. ChemPhysChem I Think anyone seriously working in this area would find having this book readily available to be a great advantage. ChemPhysChem


Researchers involved with low temperature plasmas will find this text very informative and useful. It is loaded with the most recent descriptions of basic theory and specific applications of low temperature plasmas in modern devices. (IEEE Electrical Insulation Magazine, September/October 2008) ... it makes a highly valuable contribution to the subject area and will be accessible to scientists and engineers working in the field. (ChemPhysChem) I Think anyone seriously working in this area would find having this book readily available to be a great advantage. (ChemPhysChem)


Researchers involved with low temperature plasmas will find this text very informative and useful. It is loaded with the most recent descriptions of basic theory and specific applications of low temperature plasmas in modern devices. (IEEE Electrical Insulation Magazine, September/October 2008) ... it makes a highly valuable contribution to the subject area and will be accessible to scientists and engineers working in the field. (ChemPhysChem) I Think anyone seriously working in this area would find having this book readily available to be a great advantage. (ChemPhysChem)


Author Information

Rainer Hippler is full professor at the Institute of Physics, University of Greifswald. Together with the Max-Planck-Institute for Plasma Physics and the Institute of Low Temperature Plasma Physics in Greifswald the University represents an important center of competence for Plasma Physics and Plasma Technology. His main subjects are complex plasmas including thin film deposition, dusty plasmas, and deposition of nano-size particles on surfaces. Holger Kersten teaches as professor at the Institute of Experimental and Applied Physics, University of Kiel. He is working in the field of plasma physics and plasma technology, with emphasis on complex (dusty) plasmas, plasma surface interaction, and ion beam diagnostics. Martin Schmidt is a leading scientist at the Institute of Low Temperature Plasma Physics in Greifswald, a center of application-oriented research which belongs to the Leibniz-Science Community. Karl H. Schoenbach holds the Batten Endowed Chair for Bioelectrics at Old Dominion University in Norfolk, Virginia, where he serves as Director of the Frank Reidy Research Center for Bioelectrics, a center devoted to research on biological effects of cold plasma and pulsed electric fields.

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