Overview

This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties are changed by bombarding wafers with atoms, which are accelerated in an ion implanter.

Full Product Details

Author:   Karen J. Kirkby ,  Russell M. Gwilliam ,  Andy Smith ,  David Chivers, QC
Publisher:   American Institute of Physics
Imprint:   American Institute of Physics
Edition:   2006 ed.
Volume:   v. 866
Dimensions:   Width: 16.70cm , Height: 1.00cm , Length: 14.50cm
Weight:   0.082kg
ISBN:  

9780735403666

ISBN 10:   073540366
Pages:   664
Publication Date:   01 December 2006
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   CD-ROM
Publisher's Status:   Active
Availability:   In Print  
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