Gate Dielectrics and MOS ULSIs: Principles, Technologies and Applications

Author:   Takashi Hori
Publisher:   Springer-Verlag Berlin and Heidelberg GmbH & Co. KG
Edition:   Softcover reprint of the original 1st ed. 1997
Volume:   v. 34
ISBN:  

9783540631828


Pages:   366
Publication Date:   28 October 1997
Format:   Hardback
Availability:   Temporarily unavailable   Availability explained
The supplier advises that this item is temporarily unavailable. It will be ordered for you and placed on backorder. Once it does come back in stock, we will ship it out to you.

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Gate Dielectrics and MOS ULSIs: Principles, Technologies and Applications


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Overview

Gate Dielectrics focusses on dielectric films satisfying the superior quality gate dielectric even in large-scale integration. The information presented is rather up to date with regard to nanometer-range ultrathin gate-dielectric films, which are indispensible for submicrometer ULSIs.

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Author:   Takashi Hori
Publisher:   Springer-Verlag Berlin and Heidelberg GmbH & Co. KG
Imprint:   Springer-Verlag Berlin and Heidelberg GmbH & Co. K
Edition:   Softcover reprint of the original 1st ed. 1997
Volume:   v. 34
Dimensions:   Width: 15.50cm , Height: 2.10cm , Length: 23.50cm
Weight:   0.700kg
ISBN:  

9783540631828


ISBN 10:   3540631828
Pages:   366
Publication Date:   28 October 1997
Audience:   Professional and scholarly ,  Professional and scholarly ,  Professional & Vocational ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   Active
Availability:   Temporarily unavailable   Availability explained
The supplier advises that this item is temporarily unavailable. It will be ordered for you and placed on backorder. Once it does come back in stock, we will ship it out to you.

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