Fundamental Aspects of Plasma Chemical Physics: Kinetics

Author:   Mario Capitelli ,  Roberto Celiberto ,  Gianpiero Colonna ,  Fabrizio Esposito
Publisher:   Springer-Verlag New York Inc.
Edition:   1st ed. 2016
Volume:   85
ISBN:  

9781441981844


Pages:   318
Publication Date:   26 November 2015
Format:   Hardback
Availability:   Manufactured on demand   Availability explained
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Fundamental Aspects of Plasma Chemical Physics: Kinetics


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Overview

"Describing non-equilibrium ""cold"" plasmas through a chemical physics approach, this book uses the state-to-state plasma kinetics, which considers each internal state as a new species with its own cross sections. Extended atomic and molecular master equations are coupled with Boltzmann and Monte Carlo methods to solve the electron energy distribution function. Selected examples in different applied fields, such as microelectronics, fusion, and aerospace, are presented and discussed including the self-consistent kinetics in RF parallel plate reactors, the optimization of negative ion sources and the expansion of high enthalpy flows through nozzles of different geometries. The book will cover the main aspects of the state-to-state kinetic approach for the description of nonequilibrium cold plasmas, illustrating the more recent achievements in the development of kinetic models including the self-consistent coupling of master equations and Boltzmann equation for electron dynamics.To give a complete portrayal, the book will assess fundamental concepts and theoretical formulations, based on a unified methodological approach, and explore the insight in related scientific problems still opened for the research community."

Full Product Details

Author:   Mario Capitelli ,  Roberto Celiberto ,  Gianpiero Colonna ,  Fabrizio Esposito
Publisher:   Springer-Verlag New York Inc.
Imprint:   Springer-Verlag New York Inc.
Edition:   1st ed. 2016
Volume:   85
Dimensions:   Width: 15.50cm , Height: 1.90cm , Length: 23.50cm
Weight:   6.269kg
ISBN:  

9781441981844


ISBN 10:   1441981845
Pages:   318
Publication Date:   26 November 2015
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   Active
Availability:   Manufactured on demand   Availability explained
We will order this item for you from a manufactured on demand supplier.

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Reviews

The work will be a valuable resource for researchers using many applications involving nonequilibrium cold plasmas such as plasma beams, etching, cleaning, deposition, surface activation, and gas lasers. ... Extensive references are provided, chapter-by-chapter, in addition to useful tables of reactions and processes with descriptions and references. ... Summing Up: Recommended. Graduate students, researchers/faculty, and professionals/practitioners. (T. Eastman, Choice, Vol. 53 (10), June, 2016)


Author Information

Mario Capitelli, University of Bari, mario.capitelli@ba.imip.cnr.it Gianpiero Colonna, IMIP CNR Fabrizio Esposito, IMIP CNR Khaled Hassouni, Institut Galilee-Univeriste Paris Annarita Laricchiuta, IMIP CNR Savino Longo, University of Bari

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