Overview

Extreme ultraviolet (EUV) lithography is a next generation platform with the potential to extend Moore's Law. The EUV mirror is a fundamental component of this system. Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and memory requirements, providing a comprehensive grounding in the fundamentals of the EUV mirror and knowledge of the finite-difference time-domain (FDTD) method. The discussion is made timely by the opening of commercial avenues for the application of EUV as it begins to be implemented in the development of 5G, AI, edge computing, VR and the Internet of Things. This book explores the theory, function and fabrication of EUV mirrors, as well as the correlation between design by Fresnel’s equations and design by photonic bands, and develops a rigorous and efficient FDTD method by applying these considerations to three simulation cases.  Intended primarily for EUV industry professionals, Efficient Extreme Ultraviolet Mirror Design will be of particular use to researchers investigating large scale problems or near-field scattering problems in EUV lithography. It will serve as an excellent reference text for anyone working in or studying optical engineering, as well as a high-level introduction for researchers from other fields interested in photolithography and the FDTD method.  Key Features:   Addresses knowledge of extreme ultraviolet (EUV) mirrors and EUV lithography.  Establishes a relation between photonic bands and Fresnel’s equation.  Introduces the high reflectivity EUV mirror design rules.  Applies numerical simulation for EUV mirror design.  Details efficient finite-difference time-domain (FDTD) approach. 

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9780750326506

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Dr Yen-Min Lee obtained his PhD from the National Taiwan University (Taipei, Taiwan) before joining ASML Holding as a mechatronics engineer in their motion design group in the USA. He went on to join the optical design group at Eindhoven and served as a senior physics engineer in the optical metrology group (Linkou, Taiwan). His research interests include computational lithography, large-scale electromagnetic problems, parallel computing, inverse algorithms, optical metrology, and medical imaging.

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