Chemical Vapor Deposition: Principles and Applications

Author:   M. L. Hitchman (University of Strathclyde) ,  K. F. Jensen (Massachusetts Institute of Technology) ,  M. L. Hitchman
Publisher:   Elsevier Science Publishing Co Inc
ISBN:  

9780123496706


Pages:   677
Publication Date:   26 January 1993
Format:   Hardback
Availability:   In Print   Availability explained
Limited stock is available. It will be ordered for you and shipped pending supplier's limited stock.

Our Price $1016.40 Quantity:  
Add to Cart

Share |

Chemical Vapor Deposition: Principles and Applications


Add your own review!

Overview

This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.

Full Product Details

Author:   M. L. Hitchman (University of Strathclyde) ,  K. F. Jensen (Massachusetts Institute of Technology) ,  M. L. Hitchman
Publisher:   Elsevier Science Publishing Co Inc
Imprint:   Academic Press Inc
Dimensions:   Width: 15.20cm , Height: 3.90cm , Length: 22.90cm
Weight:   1.150kg
ISBN:  

9780123496706


ISBN 10:   0123496705
Pages:   677
Publication Date:   26 January 1993
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   Out of Print
Availability:   In Print   Availability explained
Limited stock is available. It will be ordered for you and shipped pending supplier's limited stock.

Table of Contents

Reviews

Author Information

Tab Content 6

Author Website:  

Customer Reviews

Recent Reviews

No review item found!

Add your own review!

Countries Available

All regions
Latest Reading Guide

Aorrng

Shopping Cart
Your cart is empty
Shopping cart
Mailing List