Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications
Author:   Maurice H. Francombe (Georgia State University, Atlanta, U.S.A.) ,  John L. Vossen (RCA Laboratories, Princeton, New Jersey)
Publisher:   Elsevier Science Publishing Co Inc
Volume:   v. 23
ISBN:  

9780125330237


Pages:   311
Publication Date:   14 November 1997
Format:   Hardback
Availability:   In Print   Availability explained
Limited stock is available. It will be ordered for you and shipped pending supplier's limited stock.

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Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications


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Author:   Maurice H. Francombe (Georgia State University, Atlanta, U.S.A.) ,  John L. Vossen (RCA Laboratories, Princeton, New Jersey)
Publisher:   Elsevier Science Publishing Co Inc
Imprint:   Academic Press Inc
Volume:   v. 23
Dimensions:   Width: 15.20cm , Height: 2.20cm , Length: 22.90cm
Weight:   0.620kg
ISBN:  

9780125330237


ISBN 10:   0125330235
Pages:   311
Publication Date:   14 November 1997
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   Out of Print
Availability:   In Print   Availability explained
Limited stock is available. It will be ordered for you and shipped pending supplier's limited stock.

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