Overview

Thin film technology is used in many applications such as microelectronics, optics, hard and corrosion resistant coatings and micromechanics, and thin films form a uniquely versatile material base for the development of novel technologies within these industries. Thin film growth provides an important and up-to-date review of the theory and deposition techniques used in the formation of thin films. Part one focuses on the theory of thin film growth, with chapters covering nucleation and growth processes in thin films, phase-field modelling of thin film growth and surface roughness evolution. Part two covers some of the techniques used for thin film growth, including oblique angle deposition, reactive magnetron sputtering and epitaxial growth of graphene films on single crystal metal surfaces. This section also includes chapters on the properties of thin films, covering topics such as substrate plasticity and buckling of thin films, polarity control, nanostructure growth dynamics and network behaviour in thin films. With its distinguished editor and international team of contributors, Thin film growth is an essential reference for engineers in electronics, energy materials and mechanical engineering, as well as those with an academic research interest in the topic.

Full Product Details

Author:   Zexian Cao (Chinese Academy of Sciences, China)
Publisher:   Elsevier Science & Technology
Imprint:   Woodhead Publishing Ltd
Dimensions:   Width: 15.60cm , Height: 2.40cm , Length: 23.40cm
Weight:   0.800kg
ISBN:  

9781845697365

ISBN 10:   1845697367
Pages:   432
Publication Date:   18 July 2011
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   Unknown
Availability:   Awaiting stock  

Table of Contents

Contributor contact details Praface Part I: Theory of thin film growth Chapter 1: Measuring nucleation and growth processes in thin films Abstract: 1.1 Introduction 1.2 Basic theory of epitaxial growth 1.3 Observation method of atomic steps 1.4 Two-dimensional-island nucleation and step-flow growth modes 1.5 The motion of atomic steps on a growing and evaporating Si(111) surface 1.6 Morphological instability of atomic steps 1.7 Conclusion and future trends 1.9 Appendix Chapter 2: Quantum electronic stability of atomically uniform films Abstract: 2.1 Introduction 2.2 Electronic growth 2.3 Angle-resolved photoemission spectroscopy 2.4 Atomically uniform films 2.5 Quantum thermal stability of thin films 2.6 General principles of film stability and nanostructure development 2.7 Beyond the particle-in-a-box 2.8 Future trends 2.9 Acknowledgments Chapter 3: Phase-field modeling of thin film growth Abstract: 3.1 Introduction 3.2 Modeling 3.3 Numerical results 3.4 Conclusion Chapter 4: Analysing surface roughness evolution in thin films Abstract: 4.1 Introduction 4.2 Roughness during homo-epitaxial growth 4.3 Roughness during hetero- or non-epitaxial growth 4.4 Future trends Chapter 5: Modelling thin film deposition processes based on real-time observation Abstract: 5.1 Introduction: time resolved surface science 5.2 Basics of growth and relevant length of and timescales for in-situ observation of film deposition 5.3 Experimental techniques for real-time and in-situ studies 5.4 Experimental case studies 5.5 Future trends 5.6 Sources of further information and advice Part II: Techniques of thin film growth Chapter 6: Silicon nanostructured films grown on templated surfaces by oblique angle deposition Abstract: 6.1 Introduction 6.2 Preparation of templated surface for oblique angle deposition 6.3 Fan-out on templated surface with normal incident flux 6.4 Fan-out growth on templated surfaces with oblique angle incident flux 6.5 Control of fan-out growth with substrate rotations 6.6 Applications and future trends Chapter 7: Phase transitions in colloidal crystal thin films Abstract: 7.1 Introduction 7.2 Experimental tools 7.3 Description of colloidal crystal phases: historical survey 7.4 Phase transition sequence in colloidal crystal thin films 7.5 Conclusions and future trends 7.6 Acknowledgements Chapter 8: Thin film growth for thermally unstable noble-metal nitrides by reactive magnetron sputtering Abstract: 8.1 Introduction 8.2 Deposition of stoichiometric Cu3N 8.3 Nitrogen re-emission 8.4 Doping of Cu3N by co-sputtering 8.5 Conclusions Chapter 9: Growth of graphene layers for thin films Abstract: 9.1 Introduction 9.2 Large-scale pattern growth of graphene films for stretchable transparent electrodes 9.3 Roll-to-roll production of 30-inch graphene films for transparent electrodes 9.4 Conclusions Chapter 10: Epitaxial growth of graphene thin films on single crystal metal surfaces Abstract: 10.1 Introduction 10.2 Structure of graphene on metals 10.3 Growth of graphene on a metal 10.4 Future trends 10.5 Sources of further information and advice 10.6 Acknowledgements Chapter 11: Electronic properties and adsorption behaviour of thin films with polar character Abstract: 11.1 Introduction to oxide polarity 11.2 Polar oxide films 11.3 Measuring polarity of thin oxide films 11.4 Adsorption properties of polar films 11.5 Conclusion and future trends 11.7 Acknowledgements 11.6 Sources of further information and advice Chapter 12: Polarity controlled epitaxy of III-nitrides and ZnO by molecular beam epitaxy Abstract: 12.1 Introduction 12.2 Lattice polarity and detection methods 12.3 Polarity issues at heteroepitaxy and homoepitaxy 12.4 Polarity controlled epitaxy of GaN and AlN 12.5 Polarity controlled epitaxy of InN 12.6 Polarity controlled epitaxy of ZnO 12.7 Conclusions Chapter 13: Understanding substrate plasticity and buckling of thin films Abstract: 13.1 Introduction 13.2 Experimental observations 13.3 Modelling 13.4 Discussion 13.5 Conclusions Chapter 14: Controlled buckling of thin films on compliant substrates for stretchable electronics Abstract: 14.1 Introduction 14.2 Mechanics of one-dimensional non-coplanar mesh design 14.3 Mechanics of two-dimensional non-coplanar mesh design 14.4 Conclusions Chapter 15: The electrocaloric effect (ECE) in ferroelectric polymer films Abstract: 15.1 Introduction 15.2 Thermodynamic considerations on materials with large electrocaloric effect (ECE) 15.3 Previous investigations on electrocaloric effect (ECE) in polar materials 15.4 Large electrocaloric effect (ECE) in ferroelectric polymer films 15.5 Future trends 15.6 Conclusion 15.7 Acknowledgements Chapter 16: Network behavior in thin films and nanostructure growth dynamics Abstract: 16.1 Introduction 16.2 Origins of network behavior during thin film growth 16.3 Monte Carlo simulations 16.4 Results and discussion 16.5 Conclusions Index

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Zexian Cao is a Professor at the Institute of Physics of the Chinese Academy of Sciences in Beijing, China.

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