Thin Film Ferroelectric Materials and Devices

Author:   R. Ramesh
Publisher:   Springer-Verlag New York Inc.
Edition:   Softcover reprint of the original 1st ed. 1997
Volume:   3
ISBN:  

9781461378358


Pages:   249
Publication Date:   14 March 2014
Format:   Paperback
Availability:   In Print   Availability explained
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Thin Film Ferroelectric Materials and Devices


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Overview

The past five years have witnessed some dramatic developments in the general area of ferroelectric thin films materials and devices. Ferroelectrics are not new materials by any stretch ofimagination. Indeed, they have been known since the early partofthis century and popular ferroelectric materials such as Barium Titanate have been in use since the second world war. In the late sixties and seventies, a considerable amountofresearch and development effort was made to create a solid state nonvolatile memory using ferroelectrics in a vary simple matrix-addressed scheme. These attempts failed primarily due to problems associated with either the materials ordue to device architectures. The early eighties saw the advent of new materials processing approaches, such as sol-gel processing, that enabled researchers to fabricate sub-micron thin films of ferroelectric materials on a silicon substrate. These pioneering developments signaled the onsetofa revival in the areaofferroelectric thin films, especially ferroelectric nonvolatile memories. Research and development effort in ferroelectric materials and devices has now hit a feverish pitch, Many university laboratories, national laboratories and advanced R&D laboratories oflarge IC manufacturers are deeply involved in the pursuit of ferroelectric device technologies. Many companies worldwide are investing considerable manpower and resources into ferroelectric technologies. Some have already announced products ranging from embedded memories in micro­ controllers, low density stand-alone memories, microwave circuit elements, andrf identification tags. There is now considerable optimism that ferroelectric devices andproducts will occupy a significant market-share in the new millennium.

Full Product Details

Author:   R. Ramesh
Publisher:   Springer-Verlag New York Inc.
Imprint:   Springer-Verlag New York Inc.
Edition:   Softcover reprint of the original 1st ed. 1997
Volume:   3
Dimensions:   Width: 15.50cm , Height: 1.40cm , Length: 23.50cm
Weight:   0.403kg
ISBN:  

9781461378358


ISBN 10:   1461378354
Pages:   249
Publication Date:   14 March 2014
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Paperback
Publisher's Status:   Active
Availability:   In Print   Availability explained
This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us.

Table of Contents

1: (Ba,Sr)TiO3 Thin Films for Dram’s.- 2: (Ba,Sr)TiO3 Films and Process Integration For DRAM Capacitor.- 3: Elastic Domains in Ferroelectric Epitaxial Films.- 4: Study of Growth Processes in Ferroelectric Films and LayeredHeterostructures via In Situ, Real-Time Ion Beam Analysis.- 5: Layered Perovskite Thin Films and Memory Devices.- 6: Pb(Zr,Ti)O3 Based Thin Film Ferroelectric Nonvolatile Memories.- 7: Chemical Vapor Deposition of Ferroelectric Thin Films.- 8: Degradation Mechanisms and Reliability Issues for Ferroelectric Thin Films.- 9: Low Voltage Performance in Lead Based Ferroelectric Thin Film Memory Elements With (La,Sr)CoO3 Electrodes.

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