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OverviewThe Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. This second edition explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of submicron dimensions. The book covers PVD, laser and E-beam assisted deposition, MBE, and ion beam methods to bring together all of the physical vapor deposition techniques. The book also includes coverage of chemical mechanical polishing that helps attain the flatness that is required by modern lithography methods and new materials used for interconnect dielectric materials, specifically organic polyimide materials. Full Product DetailsAuthor: Krishna Seshan , Krishna Seshan (Formerly Assistant Professor, Materials Science, University of Arizona)Publisher: William Andrew Publishing Imprint: William Andrew Publishing Edition: 2nd Revised edition Dimensions: Width: 15.20cm , Height: 3.90cm , Length: 22.90cm Weight: 1.156kg ISBN: 9780815514428ISBN 10: 0815514425 Pages: 658 Publication Date: 01 February 2002 Audience: Professional and scholarly , Professional & Vocational Replaced By: 9781437778731 Format: Hardback Publisher's Status: Active Availability: In stock We have confirmation that this item is in stock with the supplier. It will be ordered in for you and dispatched immediately. Table of ContentsReviewsAuthor InformationKrishna Seshan was an Assistant Professor in Materials Science at the University of Arizona with extensive professional experience as a technologist at both IBM and Intel Corporations. Dr. Seshan passed away in 2017. Tab Content 6Author Website:Countries AvailableAll regions |