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OverviewSilicide Technology for Integrated Circuits focuses on the task of developing and applying metal silicide technology as it emerges from the scientific to the prototype and manufacturing stages and provides guidance on the application of the latest emerging technology. The book begins with an overview of silicide technology and moves on to provide the fundamentals of silicide formation, including various processing methods. Topics such as the optical emission properties of Fe silicide and their importance for Si-based optoelectronics are discussed, along with Si-Ge and SOI, which represent two possible substrate frames for the next-generation of Si-based device technology. This invaluable publication also provides comprehensive coverage of the characterisation methods used in silicide technology. Full Product DetailsAuthor: Lih J. Chen (National Tsing Hua University, Taiwan)Publisher: Institution of Engineering and Technology Imprint: Institution of Engineering and Technology Edition: illustrated edition ISBN: 9780863413520ISBN 10: 0863413528 Pages: 300 Publication Date: 21 December 2004 Audience: College/higher education , Professional and scholarly , Tertiary & Higher Education , Professional & Vocational Format: Hardback Publisher's Status: Active Availability: In Print  This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us. Table of ContentsChapter 1: Silicides - an introduction Chapter 2: Silicide formation Chapter 3: Titanium silicide technology Chapter 4: Cobalt silicide technology Chapter 5: Nickel silicide technology Chapter 6: Light-emitting iron disilicide Chapter 7: Silicide contacts for Si/Ge devices Chapter 8: Silicide technology for SOI devices Chapter 9: Characterisation of metal silicidesReviewsAuthor InformationProfessor Chen received his PhD in physics from UC Berkeley in 1974. He became a faculty member in the Department of Materials Science and Engineering, National Tsing Hua University in 1977. He is currently the Dean, College of Engineering and Chair Professor, Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, Taiwan. Professor Chen has conducted extensive research on integrated circuits thin film materials for almost three decades. His current research interests include interfacial reaction of metal thin films on silicon and Si-Ge alloys, advanced metallisation in integrated circuits as well as nanostructured materials. Tab Content 6Author Website:Countries AvailableAll regions |
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