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OverviewSilicide Technology for Integrated Circuits focuses on the task of developing and applying metal silicide technology as it emerges from the scientific to the prototype and manufacturing stages and provides guidance on the application of the latest emerging technology. The book begins with an overview of silicide technology and moves on to provide the fundamentals of silicide formation, including various processing methods. Topics such as the optical emission properties of Fe silicide and their importance for Si-based optoelectronics are discussed, along with Si-Ge and SOI, which represent two possible substrate frames for the next-generation of Si-based device technology. This invaluable publication also provides comprehensive coverage of the characterisation methods used in silicide technology. Full Product DetailsAuthor: Lih J ChenPublisher: Institute of Electrical Engineers of Japan Imprint: Institute of Electrical Engineers of Japan Dimensions: Width: 18.90cm , Height: 1.60cm , Length: 24.60cm Weight: 0.535kg ISBN: 9781849190657ISBN 10: 1849190658 Pages: 298 Publication Date: 01 February 2023 Audience: General/trade , General Format: Paperback Publisher's Status: Active Availability: In Print  This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us. Table of ContentsReviewsAuthor InformationTab Content 6Author Website:Countries AvailableAll regions |
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