Overview

This work describes advances in the field of scanning probe lithography (SPL), a high resolution patterning technique that uses a sharp tip in close proximity to a sample to pattern nanometer-scale features on the sample. SPL is capable of patterning sub-30nm features with nanometer-scale alignment registration. It is a relatively simple, inexpensive, reliable method for patterning nanometer-scale features on various substrates. It has potential applications for nanometer-scale research, for maskless semiconductor lithography, and for photomask patterning. The authors of this book have been key players in this exciting new field. Calvin Quate has been involved since the beginning in the early 1980s. Hyongsok Tom Soh and Kathryn Wilder Guarini have been the members of this group whoin have brought about remarkable series of advances in SPM lithography. Some of these advances have been in the control of the tip which has allowed the scanning speed to be increased from m/second to mm/second. Both non-contact and in-contact writing have been demonstrated as has controlled writing of sub-100 nm lines over large steps on the substrate surface. The engineering of a custom-designed MOFSET built into each microcantilever for individual current control is another notable achievement. Micromachined arrays of probes each with individual control have been demonstrated. One of the most intriguing new aspects is the use of directly-grown carbon nanotubes as robust, high-resolution emitters. In this book the authors describe the historical context, the relevant inventions, and the prospects for eventual manufacturing use of this exciting new technology.

Full Product Details

Author:   Hyongsok T. Soh ,  Kathryn Wilder Guarini ,  Calvin F. Quate
Publisher:   Springer
Imprint:   Springer
Edition:   2001 ed.
Volume:   7
Dimensions:   Width: 15.50cm , Height: 1.40cm , Length: 23.50cm
Weight:   1.100kg
ISBN:  

9780792373612

ISBN 10:   0792373618
Pages:   197
Publication Date:   30 June 2001
Audience:   College/higher education ,  Professional and scholarly ,  Undergraduate ,  Postgraduate, Research & Scholarly
Format:   Hardback
Publisher's Status:   Active
Availability:   In Print  
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Table of Contents

1: Introduction to Scanning Probe Lithography.- 2: SPL by Electric-Field-Enhanced Oxidation.- 3: Resist Exposure Using Field-Emitted Electrons.- 4: SPL Linewidth Control.- 5: Critical Dimension Patterning Using SPL.- 6: High Speed Resist Exposure With a Single Tip.- 7: On-Chip Lithography Control.- 8: Scanning Probe Tips for SPL.- 9: Scanning Probe Arrays for Lithography.- Epilog.- List of Publications.

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