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OverviewRun-to-Run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine runs, thereby minimizing process drift, shift, and variability and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run-to-Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control. Full Product DetailsAuthor: James Moyne (University of Michigan, Ann Arbor, USA) , Arnon Max HurwitzPublisher: CRC Press Imprint: CRC Press ISBN: 9781280652882ISBN 10: 1280652888 Pages: 367 Publication Date: 01 January 2001 Audience: General/trade , General Format: Electronic book text Publisher's Status: Active Availability: In stock  We have confirmation that this item is in stock with the supplier. It will be ordered in for you and dispatched immediately. Table of ContentsReviewsAuthor InformationTab Content 6Author Website:Countries AvailableAll regions |
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