Free Delivery Over $100
|
|
|||
|
||||
OverviewThe acceleration of integrated circuit miniaturization is challenging lithographers to push the limits of optical lithography by ever more precise engineering and innovations. As IC device dimensions grow smaller, circuits outpace the introduction of shorter exposure wavelengths and higher numerical aperture lenses, increasing the importance of resolution enhancement techniques. This work summarizes the latest enhancement research that has matured since the 1980s. Theoretical and practical aspects of commonly used techniques are discussed, serving students and practising lithographers alike. #Conoptical Imaging And Resolution; Modified Illumination; Optical Proximity Correction; Alternating Phase-Shifting Mask; Attenuated Phase-Shifting Mask; Selecting Appropriate Rets; Second Generation Rets; Concluding Remarks. Full Product DetailsAuthor: Alfred Kwok-Kit WongPublisher: SPIE Press Imprint: SPIE Press Dimensions: Width: 18.00cm , Height: 1.50cm , Length: 23.00cm Weight: 0.505kg ISBN: 9780819439956ISBN 10: 0819439959 Pages: 214 Publication Date: 31 March 2001 Audience: College/higher education , Professional and scholarly , Undergraduate , Postgraduate, Research & Scholarly Format: Paperback Publisher's Status: Active Availability: To order  Stock availability from the supplier is unknown. We will order it for you and ship this item to you once it is received by us. Table of ContentsReviewsAuthor InformationTab Content 6Author Website:Countries AvailableAll regions |
||||
