|
|
|||
|
||||
OverviewThe use of thin films is continuously expanding. In the family of Physical Vapour Deposition techniques, sputtering is one of the most important over the past 40 years. In this book, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films. Full Product DetailsAuthor: D Depla , S MahieuPublisher: Springer Imprint: Springer Dimensions: Width: 23.40cm , Height: 3.10cm , Length: 15.60cm Weight: 0.816kg ISBN: 9783540869504ISBN 10: 3540869506 Pages: 592 Publication Date: 02 September 2008 Audience: General/trade , General Format: Undefined Publisher's Status: Unknown Availability: Out of stock Table of ContentsReviewsAuthor InformationTab Content 6Author Website:Countries AvailableAll regions |