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OverviewFull Product DetailsAuthor: P. Antognetti , D.A. Antoniadis , Robert W. Dutton , W.G. OldhamPublisher: Springer Imprint: Kluwer Academic Publishers Edition: 1983 ed. Volume: 62 Dimensions: Width: 15.60cm , Height: 3.80cm , Length: 23.40cm Weight: 1.064kg ISBN: 9789024728244ISBN 10: 902472824 Pages: 636 Publication Date: 30 April 1983 Audience: College/higher education , Professional and scholarly , Postgraduate, Research & Scholarly , Professional & Vocational Format: Hardback Publisher's Status: Active Availability: Temporarily unavailable  The supplier advises that this item is temporarily unavailable. It will be ordered for you and placed on backorder. Once it does come back in stock, we will ship it out to you. Table of ContentsDiffusion in Silicon.- Thermal Oxidation: Kinetics, Charges, Physical Models, and Interaction with Other Processes in VLSI Devices.- The Use of Chlorinated Oxides and Intrinsic Gettering Techniques for VLSI Processing.- Ion Implantation.- Beam Annealing of Ion Implanted Silicon.- Materials Characterization.- Modeling of Polycrystalline Silicon Structures for Integrated Circuit Fabrication Processes.- Two-Dimensional Process Simulation — Supra.- Numerical Simulation of Impurity Redistribution Near Mask Edges.- Optical and Deep UV Lithography.- Wafer Topography Simulation.- Analyses of Nonplanar Devices.- Two Dimensional MOS-Transistor Modeling.- Fielday — Finite Element Device Analyses.Reviews...this book is an extremely valuable collection on the crucial issues in numerical modeling of VLSI fabrication processes and devices, which will be useful to a large number of readers with diverse backgrounds.' American Scientist, 73 (1983) ...this book is an extremely valuable collection on the crucial issues in numerical modeling of VLSI fabrication processes and devices, which will be useful to a large number of readers with diverse backgrounds.' American Scientist, 73 (1983) ...this book is an extremely valuable collection on the crucial issues in numerical modeling of VLSI fabrication processes and devices, which will be useful to a large number of readers with diverse backgrounds.<strong>'</strong> <strong>American Scientist, 73 (1983)</strong> <br/> Author InformationTab Content 6Author Website:Countries AvailableAll regions |
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