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OverviewPolycrystalline Silicon for Integrated Circuits and Displays, Second Edition presents much of the available knowledge about polysilicon. It represents an effort to interrelate the deposition, properties, and applications of polysilicon. By properly understanding the properties of polycrystalline silicon and their relation to the deposition conditions, polysilicon can be designed to ensure optimum device and integrated-circuit performance. Polycrystalline silicon has played an important role in integrated-circuit technology for two decades. It was first used in self-aligned, silicon-gate, MOS ICs to reduce capacitance and improve circuit speed. In addition to this dominant use, polysilicon is now also included in virtually all modern bipolar ICs, where it improves the basic physics of device operation. The compatibility of polycrystalline silicon with subsequent high-temperature processing allows its efficient integration into advanced IC processes. This compatibility also permits polysilicon to be used early in the fabrication process for trench isolation and dynamic random-access-memory (DRAM) storage capacitors. In addition to its integrated-circuit applications, polysilicon is becoming vital as the active layer in the channel of thin-film transistors in place of amorphous silicon. When polysilicon thin-film transistors are used in advanced active-matrix displays, the peripheral circuitry can be integrated into the same substrate as the pixel transistors. Recently, polysilicon has been used in the emerging field of microelectromechanical systems (MEMS), especially for microsensors and microactuators. In these devices, the mechanical properties, especially the stress in the polysilicon film, are critical to successful device fabrication. Polycrystalline Silicon for Integrated Circuits and Displays, Second Edition is an invaluable reference for professionals and technicians workingwith polycrystalline silicon in the integrated circuit and display industries. Full Product DetailsAuthor: Ted KaminsPublisher: Springer-Verlag New York Inc. Imprint: Springer-Verlag New York Inc. Edition: 2nd ed. 1998. Softcover reprint of the original 2nd ed. 1998 Dimensions: Width: 15.50cm , Height: 2.00cm , Length: 23.50cm Weight: 0.611kg ISBN: 9781461375517ISBN 10: 1461375517 Pages: 378 Publication Date: 10 October 2012 Audience: Professional and scholarly , Professional & Vocational Format: Paperback Publisher's Status: Active Availability: Manufactured on demand  We will order this item for you from a manufactured on demand supplier. Table of Contents1. Deposition.- 1.1 Introduction.- 1.2 Thermodynamics and kinetics.- 1.3 The deposition process.- 1.4 Gas-phase and surface processes.- 1.5 Reactor geometries.- 1.6 Reaction.- 1.7 Deposition from disilane.- 1.8 Deposition of doped films.- 1.9 Conformai deposition.- 1.10 Enhanced deposition techniques.- 1.11 Summary.- 2. Structure.- 2.1 Nucleation.- 2.2 Surface diffusion and structure.- 2.3 Evaluation techniques.- 2.4 Grain structure.- 2.5 Grain orientation.- 2.6 Optical properties.- 2.7 Thermal conductivity.- 2.8 Mechanical properties.- 2.9 Oxygen contamination.- 2.10 Etching.- 2.11 Structural stability.- 2.12 Hemispherical-grain (HSG) polysilicon.- 2.13 Epitaxial realignment.- 2.14 Summary.- 3. Dopant Diffusion and Segregation.- 3.1 Introduction.- 3.2 Diffusion mechanism.- 3.3 Diffusion in polysilicon.- 3.4 Diffusion from polysilicon.- 3.5 Interaction with metals.- 3.6 Dopant segregation at grain boundaries.- 3.7 Computer modeling of diffusion.- 3.8 Summary.- 4. Basic Definitions of The Fuzzy Sets Theory.- 4.1 Introduction.- 4.2 Oxide growth on polysilicon.- 4.3 Conduction through oxide on polysilicon.- 4.4 Summary.- 5. Basic Definitions of The Fuzzy Sets Theory.- 5.1 Introduction.- 5.2 Undoped polysilicon.- 5.3 Amorphous silicon.- 5.4 Moderately doped polysilicon.- 5.5 Grain-boundary modification.- 5.6 Heavily doped polysilicon.- 5.7 Minority-carrier properties.- 5.8 Summary.- 6. Applications.- 6.1 Introduction.- 6.2 Silicon-gate MOS transistor.- 6.3 Nonvolatile memories.- 6.4 Polysilicon resistors.- 6.5 Fusible links.- 6.6 Gettering.- 6.7 Polysilicon contacts.- 6.8 Vertical npn bipolar transistors.- 6.9 Lateral pnp bipolar transistors.- 6.10 Device isolation.- 6.11 Dynamic random-access memories.- 6.12 Polysilicon diodes.- 6.13 Polysilicon thin-film transistors.- 6.14 Microelectromechanical Systems.- 6.15 Summary.ReviewsAuthor InformationTab Content 6Author Website:Countries AvailableAll regions |
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