Plasma Technology: Fundamentals and Applications

Author:   M. Capitelli ,  C. Gorse
Publisher:   Springer-Verlag New York Inc.
Edition:   Softcover reprint of the original 1st ed. 1992
ISBN:  

9781461365020


Pages:   224
Publication Date:   09 November 2012
Format:   Paperback
Availability:   Manufactured on demand   Availability explained
We will order this item for you from a manufactured on demand supplier.

Our Price $145.17 Quantity:  
Add to Cart

Share |

Plasma Technology: Fundamentals and Applications


Add your own review!

Overview

The present book contains the proceedings of the workshop ""Plasma Technology and Applications"" which was held at 11 Ciocco (Lucca-Italy) during 5-6 July 1991. The workshop was organized just before ICPIG XX to emphasize the role of plasma physics and plasma chemistry in different fields of technology. Topics cover different applications such as lamps, plasma treatment of materials (etching, deposition, nitriding), plasma sources (microwave excitation, negative ion sources) and plasma destruction of pollutants. Several chapters deal with basic concepts in plasma physics, non- equilibrium plasma modeling and plasma diagnostics as well as with laser interaction with solid targets. The authors gratefully acknowledge the financial support provided by university of Bari (Italy) and by CNR (Centro di Studio per la Chimica dei Plasmi, Istituto di Fisica Atomica e Molecolare (IFAM) and Progetto Finalizzato Materiali Speciali per Tecnologie Avanzate) as well as the sponsorship of ENEA. M. Capitelli C. Gorse v CONTENTS Plasmas in nature, laboratory and technology 1 A. M. Ignatov and A. A. Rukhadze Laser diagnostics of plasmas 11 L. Pyatnitsky Probe diagnostics of plasmas 27 G. Dilecce Theory, properties and applications of non- equilibrium plasmas created by external energy sources 45 E. Son Non-Equilibrium plasma modeling 59 M. Capitel1i , R. Celiberto, G. Capriati, C. Gorse and S. Longo Gas discharge lamps 81 M. Koedam Plasma etching processes and diagnostics 93 R. d'Agostino and F. Fracassi Plasma deposition: processes and diagnostics 109 A.

Full Product Details

Author:   M. Capitelli ,  C. Gorse
Publisher:   Springer-Verlag New York Inc.
Imprint:   Springer-Verlag New York Inc.
Edition:   Softcover reprint of the original 1st ed. 1992
Dimensions:   Width: 17.80cm , Height: 1.20cm , Length: 25.40cm
Weight:   0.456kg
ISBN:  

9781461365020


ISBN 10:   1461365023
Pages:   224
Publication Date:   09 November 2012
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Paperback
Publisher's Status:   Active
Availability:   Manufactured on demand   Availability explained
We will order this item for you from a manufactured on demand supplier.

Table of Contents

Plasmas in nature, laboratory and technology.- Laser diagnostics of plasmas.- Probe diagnostics of plasmas.- Theory, properties and applications of non-equilibrium plasmas created by external energy sources.- Non-Equilibrium plasma modeling.- Gas discharge lamps.- Plasma etching processes and diagnostics.- Plasma deposition: processes and diagnostics.- Correlations between active plasma species and steel surface nitriding in microwave post-discharge reactors.- Simultaneous removal of NOX,SOX and soot in diesel engine exhaust by plasma/oil dynamics means.- DeNOx DeSOx process by gas energization.- Microwave excitation technology.- Negative ion source technology.- Quasi-stationary optical discharges on solid targets.

Reviews

Author Information

Tab Content 6

Author Website:  

Customer Reviews

Recent Reviews

No review item found!

Add your own review!

Countries Available

All regions
Latest Reading Guide

lgn

al

Shopping Cart
Your cart is empty
Shopping cart
Mailing List