Overview

Taken from the proceedings of a symposium in France in 1996, this text contains 28 contributions from 18 contributors, and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. The book should be suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.

Full Product Details

Author:   P.F. Williams
Publisher:   Springer
Imprint:   Springer
Edition:   1997 ed.
Volume:   336
Dimensions:   Width: 15.50cm , Height: 3.30cm , Length: 23.50cm
Weight:   2.320kg
ISBN:  

9780792345671

ISBN 10:   0792345673
Pages:   613
Publication Date:   31 May 1997
Audience:   College/higher education ,  Professional and scholarly ,  Undergraduate ,  Postgraduate, Research & Scholarly
Format:   Hardback
Publisher's Status:   Active
Availability:   In Print  
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Table of Contents

Plasma Etching.- to Plasma Etching.- Plasma Chemistry, Basic Processes and PECVD.- The Role of Ions in Reactive Ion Etching with Low Density Plasmas.- SiO2 Etching in High-Density Plasmas: Differences with Low-Density Plasmas.- Plasma Deposition.- to Plasma Enhanced Chemical Vapor Deposition.- Topography Evolution During Semiconductor Processing.- Deposition of Amorphous Silicon.- Plasma Sources.- High Density Sources for Plasma Etching.- Resonant Plasma Excitation by Electron Cyclotron Waves—Fundamentals and Applications.- The Transition from Capacitive to Inductive to Wave Sustained Discharges.- Physics of Surface-Wave Discharges.- Plasma-Surface Interactions.- Surface Science Aspects of Etching and Wall Reactions in High Density Plasmas.- Plasma-Surface Interactions.- Cl2 Plasma-Si Surface Interactions in Plasma Etching.- Numerical Modeling.- Particle in Cell Monte Carlo Collision Codes (PIC-MCC); Methods and Applications to Plasma Processing.- Fluid and Hybrid Models of Non Equilibrium Discharges.- Plasma Diagnostics.- Optical Diagnostics of Processing Plasmas.- Optical Diagnostics of Plasmas: A Tool for Process Control.- Infrared Absorption Spectroscopy as a Diagnostic for Processing Plasmas.- Ellipsometric Analysis of Plasma Deposited and Plasma Etched Materials.- Mass Spectrometry of Reactive Plasmas.- Less Conventional Processing Applications of Plasmas.- Deposition of Silicon Dioxide Films using the Helicon Diffusion Reactor for Integrated Optics Applications.- Remote Plasma Processing.- Magnetized Surface-Wave Discharges for Submicrometer Pattern Transfer.- Dusty Plasmas: Fundamental Aspects and Industrial Applications.- Industrial Application of Plasmas for Processing.- Low Energy Plasma Beams for Semiconductor Technology.- Process Control Concepts.- Issuesand Solutions for Applying Process Control to Semiconductor Manufacturing.

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