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OverviewTaken from the proceedings of a symposium in France in 1996, this text contains 28 contributions from 18 contributors, and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. The book should be suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge. Full Product DetailsAuthor: P.F. WilliamsPublisher: Kluwer Academic Publishers Imprint: Kluwer Academic Publishers Edition: 1997 ed. Volume: 336 Dimensions: Width: 15.50cm , Height: 3.30cm , Length: 23.50cm Weight: 2.320kg ISBN: 9780792345671ISBN 10: 0792345673 Pages: 613 Publication Date: 31 May 1997 Audience: College/higher education , Professional and scholarly , Undergraduate , Postgraduate, Research & Scholarly Format: Hardback Publisher's Status: Active Availability: In Print This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us. Table of ContentsReviewsAuthor InformationTab Content 6Author Website:Countries AvailableAll regions |
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