Photomodulated Optical Reflectance: A Fundamental Study Aimed at Non-Destructive Carrier Profiling in Silicon

Author:   Janusz Bogdanowicz
Publisher:   Springer-Verlag Berlin and Heidelberg GmbH & Co. KG
Edition:   2012 ed.
ISBN:  

9783642426865


Pages:   204
Publication Date:   17 July 2014
Format:   Paperback
Availability:   Manufactured on demand   Availability explained
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Photomodulated Optical Reflectance: A Fundamental Study Aimed at Non-Destructive Carrier Profiling in Silicon


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Overview

One of the critical issues in semiconductor technology is the precise electrical characterization of ultra-shallow junctions. Among the plethora of measurement techniques, the optical reflectance approach developed in this work is the sole concept that does not require physical contact, making it suitable for non-invasive in-line metrology. This work develops extensively all the fundamental physical models of the photomodulated optical reflectance technique and introduces novel approaches that extend its applicability from dose monitoring towards detailed carrier profile reconstruction. It represents a significant breakthrough in junction metrology with potential for industrial implementation.

Full Product Details

Author:   Janusz Bogdanowicz
Publisher:   Springer-Verlag Berlin and Heidelberg GmbH & Co. KG
Imprint:   Springer-Verlag Berlin and Heidelberg GmbH & Co. K
Edition:   2012 ed.
Dimensions:   Width: 15.50cm , Height: 1.20cm , Length: 23.50cm
Weight:   0.355kg
ISBN:  

9783642426865


ISBN 10:   3642426867
Pages:   204
Publication Date:   17 July 2014
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Paperback
Publisher's Status:   Active
Availability:   Manufactured on demand   Availability explained
We will order this item for you from a manufactured on demand supplier.

Table of Contents

Theory of Perturbation of the Reflectance.- Theory of Perturbation of the Refractive Index.- Theory of Carrier and Heat Transport in Homogeneously Doped Silicon.- Extension of the Transport Theory to Ultra-Shallow Doped Silicon Layers.- Assessment of the Model.- Application of the Model to Carrier Profling.

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