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OverviewThis work brings together 68 papers from the 18th Bacus symposium on photomask technology and management. It covers photomask patterning, defects, inspection, repair, mask metrology and advanced mask metrology. Full Product DetailsAuthor: Abboud , Frank E. AbboudPublisher: SPIE Press Imprint: SPIE Press Volume: v. 3546 ISBN: 9780819430076ISBN 10: 0819430072 Pages: 686 Publication Date: 31 May 1999 Audience: Professional and scholarly , Professional & Vocational Format: Paperback Publisher's Status: Active Availability: To order Stock availability from the supplier is unknown. We will order it for you and ship this item to you once it is received by us. Table of ContentsReviewsAuthor InformationTab Content 6Author Website:Countries AvailableAll regions |