Overview

Explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing. Considers future trends in lithography and resist material technology. Reviews the interaction of light, electron beams, and X-rays with resist materials.

Full Product Details

Author:   Saburo Nonogaki ,  Ueno Takumi ,  Toshio Ito
Publisher:   Taylor & Francis Inc
Imprint:   CRC Press Inc
Dimensions:   Width: 15.20cm , Height: 2.20cm , Length: 22.90cm
Weight:   0.589kg
ISBN:  

9780824799519

ISBN 10:   0824799518
Pages:   336
Publication Date:   25 June 1998
Audience:   College/higher education ,  Professional and scholarly ,  Postgraduate, Research & Scholarly ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   Active
Availability:   In Print  
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Saburo Nonogaki, Ueno Takumi, Toshio Ito

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