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OverviewThe conference is focused on recent advances and emerging technologies in semiconductor processing before, during and after ion implantation. The content encompasses fundamental physical understanding, common and novel applications as well as equipment issues, maintenance and design. The primary audience is process engineers in the microelectronics industry. Additional contributions come from academia and other industry segments (automotive, aerospace, and medical device manufacturing). Full Product DetailsAuthor: Edmund G. Seebauer , Susan B. Felch , Amitabh Jain , Yevgeniy V. KondratenkoPublisher: American Institute of Physics Imprint: American Institute of Physics Edition: 2008 ed. Volume: No. 1066 Dimensions: Width: 21.60cm , Height: 3.60cm , Length: 27.90cm Weight: 1.538kg ISBN: 9780735405974ISBN 10: 0735405972 Pages: 576 Publication Date: 01 December 2008 Audience: Professional and scholarly , Professional & Vocational Format: Hardback Publisher's Status: Active Availability: In Print This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us. Table of ContentsReviewsAuthor InformationTab Content 6Author Website:Countries AvailableAll regions |