Ion Implantation Technology: 17th International Conference on Ion Implantation Technology, IIT 2008, Monterey, California, 8-13 June 2008

Author:   Edmund G. Seebauer ,  Susan B. Felch ,  Amitabh Jain ,  Yevgeniy V. Kondratenko
Publisher:   American Institute of Physics
Edition:   2008 ed.
Volume:   No. 1066
ISBN:  

9780735405974


Pages:   576
Publication Date:   01 December 2008
Format:   Hardback
Availability:   In Print   Availability explained
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Ion Implantation Technology: 17th International Conference on Ion Implantation Technology, IIT 2008, Monterey, California, 8-13 June 2008


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Overview

The conference is focused on recent advances and emerging technologies in semiconductor processing before, during and after ion implantation. The content encompasses fundamental physical understanding, common and novel applications as well as equipment issues, maintenance and design. The primary audience is process engineers in the microelectronics industry. Additional contributions come from academia and other industry segments (automotive, aerospace, and medical device manufacturing).

Full Product Details

Author:   Edmund G. Seebauer ,  Susan B. Felch ,  Amitabh Jain ,  Yevgeniy V. Kondratenko
Publisher:   American Institute of Physics
Imprint:   American Institute of Physics
Edition:   2008 ed.
Volume:   No. 1066
Dimensions:   Width: 21.60cm , Height: 3.60cm , Length: 27.90cm
Weight:   1.538kg
ISBN:  

9780735405974


ISBN 10:   0735405972
Pages:   576
Publication Date:   01 December 2008
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   Active
Availability:   In Print   Availability explained
This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us.

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