Free Delivery Over $100
|
|
|||
|
||||
OverviewUpdated and expanded! Reviews the theory, materials, and processes that are used in the lithographic process. Opens with a brief historical introduction to the advances in microlithography. Discusses four major topics: the physics of the lithographic process, organic resist materials, resist processing, and plasma etching. Designed as a tutorial for researchers with no experience in the field, as well as those experienced in microlithography. Will also prove invaluable to those already involved in microlithography. Includes numerous references for more detailed reading on specific aspects of microlithography. Full Product DetailsAuthor: Larry F. Thompson , C. Grant Willson , Murrae J. Bowden , Murrae J. Bowden (Bell Communications Research, USA)Publisher: American Chemical Society Imprint: American Chemical Society Edition: 2nd Revised edition Dimensions: Width: 15.80cm , Height: 3.40cm , Length: 23.60cm Weight: 0.888kg ISBN: 9780841228481ISBN 10: 0841228485 Pages: 540 Publication Date: 01 January 1994 Audience: Professional and scholarly , Professional & Vocational Format: Hardback Publisher's Status: No Longer Our Product Availability: Out of stock  The supplier is temporarily out of stock of this item. It will be ordered for you on backorder and shipped when it becomes available. Table of ContentsReviewsAuthor InformationTab Content 6Author Website:Countries AvailableAll regions |
||||
