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OverviewInterconnect has become the dominating factor in determining system performance in nanometer technologies. Dedicated to this subject, Interconnect Noise Optimization in Nanometer Technologies provides insight and intuition into layout analysis and optimization for interconnect in high speed, high complexity integrated circuits. The authors bring together a wealth of information presenting a range of CAD algorithms and techniques for synthesizing and optimizing interconnect. Practical aspects of the algorithms and the models are explained with sufficient details. The book investigates the most effective parameters in layout optimization. Different post-layout optimization techniques with complexity analysis and benchmarks tests are provided. The impact crosstalk noise and coupling on the wire delay is analyzed. Parameters that affect signal integrity are also considered. Full Product DetailsAuthor: Mohamed Elgamel , Magdy A. BayoumiPublisher: Springer-Verlag New York Inc. Imprint: Springer-Verlag New York Inc. Edition: 2006 ed. Dimensions: Width: 15.50cm , Height: 1.10cm , Length: 23.50cm Weight: 0.454kg ISBN: 9780387258706ISBN 10: 0387258701 Pages: 137 Publication Date: 21 November 2005 Audience: Professional and scholarly , Professional & Vocational Format: Hardback Publisher's Status: Active Availability: Out of stock  The supplier is temporarily out of stock of this item. It will be ordered for you on backorder and shipped when it becomes available. Table of ContentsReviewsAuthor InformationTab Content 6Author Website:Countries AvailableAll regions |
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