Overview

"The authors have attempted in this book, to produce a reference on high resolution focused ion beams (FIBs) that should be useful for both the user and the designer of FIB instrumentation. They have included a mix of theory and applications. The field of FIBs has advanced rapidly since the application of the first field emission ion sources in the early 1970s. The development of the liquid metal ion source (LMIS) in the late 1960s and early 1970s and its application for FIBs in the late 1970s has resulted in a powerful tool for research and for industry. The authors have tried to cover the essential topics needed to understand what FIB technology is, how and why it works, and how it is applied. To this end they have included a chapter on the physics of the LMIS that includes practical information on these important ion sources, and two chapters that provide an introduction to ion optics and a ""practical"" discussion of ion optics as it is used in the FIB system today. Because FIBs are so often used to alter materials they have included a chapter on the interaction of ions with matter. The final chapter is a comprehensive coverage of FIB applications up to the year 2000."

Full Product Details

Author:   Jon Orloff ,  Lynwood Swanson ,  Mark Utlaut
Publisher:   Springer Science+Business Media
Imprint:   Kluwer Academic/Plenum Publishers
Edition:   2003 ed.
Dimensions:   Width: 15.50cm , Height: 2.00cm , Length: 23.50cm
Weight:   1.390kg
ISBN:  

9780306473500

ISBN 10:   030647350
Pages:   304
Publication Date:   31 October 2002
Audience:   Professional and scholarly ,  General/trade ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   Active
Availability:   In Print  
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Table of Contents

1. Field Ionization Sources.- 1.1. Gas Field Ionization Sources.- 1.2. Liquid Metal Field Ionization Sources.- 2. Physics of Liquid Metal Ion Sources.- 2.1. Introduction.- 2.2. Theory of LMIS Operation.- 2.3. Early Experiments on Emission of Ions from Liquid Metals (Pre-1975).- 2.4. Ion Production.- 2.5. Theoretical Description of LMIS Behavior.- 2.6. Experimental Studies of LMIS Shape.- 2.7. Later Theoretical Developments: Characterization of Emission.- 2.8. Liquid Flow Characteristics in the LMIS.- 2.9. The Effect of Space Charge on Ion Emission and the Shape of the I–V Characteristic.- 2.10. Low Current Emission.- 2.11. Conclusions Regarding LMIS Theory.- 2.12. LMIS Emission Characteristics.- 2.13. Elements and Alloys Used in LMIS.- 2.14. Energy Distributions.- 2.15. Angular Intensity and Distributions.- 2.16. Noise.- 2.17. Source Lifetime.- 2.18. Emitter Fabrication and Testing Methods.- 2.19. Properties of Materials Used In LMIS.- 3. Ion Optics for LMIS.- 3.1. Introduction.- 3.2. Optical Properties of the LMIS.- 3.3. Review of Charged Particle Optics.- 3.4. Lens Aberrations.- 3.5. Ion Focusing Systems for Field Emission Ion Sources.- 3.6. Wave Optics.- 3.7. Ion Optical Formalism and Resolution.- 3.8. Space Charge Effects.- 3.9. Limits of Resolution.- 3.10. Focusing System Design Considerations.- 4. Interaction of Ions with Solids.- 4.1. Introduction.- 4.2. Energy Losses.- 4.3. Channeling.- 4.4. Damage to the Sample.- 4.5. Sputtering.- 5. Practical Focused Ion Beam Optics and Systems.- 5.1. Introduction.- 5.2. Sources.- 5.3. Practical Focusing Optics.- 5.4. Lens Design.- 5.5. The Deflection System.- 5.6. E x B Mass Filter Design.- 5.7. Beam Alignment Techniques.- 5.8. Real Lens Defects.- 5.9. Magnetic Field Perturbations.- 5.10. Insulator Shielding.- 5.11. CoulombBeam Interactions.- 5.12. Wave Optics vs. Geometrical Optics.- 5.13. How to Evaluate the Performance.- 5.14. Detectors and Imaging.- 5.15. Ion Microscopy: Using Both Ions and Electrons to Image.- 5.16. Collecting Information: Forming Good Images.- 5.17. Imaging and Milling Vexations due to Charging.- 6. Applications of Focused Ion Beams.- 6.1. Introduction.- 6.2. Micro-Machining.- 6.3. Making A Cross-Section Cut.- 6.4. Tem Sample Preparation.- 6.5. Using Sample Damage to Advantage.- 6.6. Deposition of Materials.- 6.7. Enhanced Etch and Deposition.- 6.8. Scanning Ion Microscopy (SIM).- 6.9. Micro-Milling Copper.- 6.10. Access to Die Circuitry from the “Backside”.- 6.11. Secondary Ion Mass Spectrometry (Fib/Sims): The Exploitation of Destruction.- 6.12. FIB Implantation.- 6.13. FIB Lithography.- 6.14. Micro-Mechanical Devices (MEMS).- Appendix 1 Elements of the Theory of Field Desorption and Ionization.- Appendix 2 Table of Sputter Yields.- About the Authors.

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