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OverviewFull Product DetailsAuthor: John N. Helbert (Motorola, USA) , John N. Helbert (Motorola, USA)Publisher: William Andrew Publishing Imprint: William Andrew Publishing Edition: 2nd edition Dimensions: Width: 15.20cm , Height: 5.20cm , Length: 22.90cm Weight: 1.500kg ISBN: 9780815514442ISBN 10: 0815514441 Pages: 1022 Publication Date: 01 April 2001 Audience: Professional and scholarly , Professional & Vocational Format: Hardback Publisher's Status: Out of Print Availability: Out of print, replaced by POD  We will order this item for you from a manufatured on demand supplier. Table of ContentsIssues and Trends Affecting Lithography Tool Selection Strategy Resist Technology: Design, Processing and Applications Lithography Process Monitoring and Defect Detection Techniques and Tools for Photo Metrology Techniques and Tools for Optical Lithography Microlithography Tool Automation Electron Beam ULSI Applications Rational Vibration and Structural Dynamics for Lithographic Tool Installations Applications of Ion Microbeam Lithography and Direct Processing X-Ray LithographyReviewsAuthor InformationTab Content 6Author Website:Countries AvailableAll regions |
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