Overview

Full Product Details

Author:   Jerome J. Cuomo ,  Stephen M. Rossnagel ,  Harold R. Kaufman
Publisher:   William Andrew Publishing
Imprint:   William Andrew Publishing
Dimensions:   Width: 15.20cm , Height: 2.50cm , Length: 22.90cm
Weight:   0.710kg
ISBN:  

9780815511991

ISBN 10:   081551199
Pages:   456
Publication Date:   31 December 1989
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   Out of Print
Availability:   In Print  
Limited stock is available. It will be ordered for you and shipped pending supplier's limited stock.

Table of Contents

Perspective on Past, Present and Future Uses of Ion Beam Technology Part I. Ion Beam Technology Gridded Broad-beam Ion Sources ECR Ion Sources Hall Effect Ion Sources Ionized Cluster Beam (ICB) Deposition and Epitaxy Part II. Sputtering Phenomena Quantitative Sputtering Laser-induced Fluorescence as a Tool for the Study of Ion Beam Sputtering Characterization of Atoms Desorbed from Surfaces by Ion Bombardment Using Multiphoton Ionization Detection Part III. Film Modification and Synthesis The Modification of Films by Ion Bombardment Control of Film Properties by Ion-assisted Deposition Using Broad Beam Sources Etching with Directed Beams Film Growth Modification by Concurrent Ion Bombardment: Theory and Simulation Interface Structure and Thin Film Adhesion Modification of Thin Films by Off-normal Incidence Ion Bombardment Ion Beam Interactions with Polymer Surfaces Topography: Texturing Effects Methods and Techniques of Ion Beam Processes Ion-assisted Dielectric and Optical Coatings Diamond and Diamond-like Thin Films by Ion Beam Techniques Index

Reviews

Author Information

Tab Content 6

Author Website:  

Customer Reviews

Recent Reviews

No review item found!

Add your own review!

Countries Available

All regions