Handbook of Chemical Vapor Deposition: Principles, Technology and Applications

Author:   Hugh O. Pierson (Sandia National Laboratories (retired))
Publisher:   William Andrew Publishing
Edition:   2nd edition
ISBN:  

9780815514329


Pages:   506
Publication Date:   01 September 1999
Format:   Hardback
Availability:   In Print   Availability explained
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Handbook of Chemical Vapor Deposition: Principles, Technology and Applications


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Overview

Keeping up with the latest advances in technology doesn't have to be difficult, especially with a flexible and relatively uncomplicated technology like Chemical Vapor Deposition. The need to keep up with such a technology, though, is paramount. Consider that the size of the Chemical Vapor Deposition market is estimated to have doubled in the last six years. The technology has developed at a rapid rate as well, and the number and scope of its applications and their impact on the markets they serve have increased considerably. Two major contributors to this growth are plasma CVD and metallo-organic CVD (MOCVD). Both of these technologies are extensively reviewed in this new edition of the Handbook of Chemical Vapor Deposition. Also of growing importance is the use of CVD in the production of semiconductor and related applications, which are heavily emphasized in this handbook providing a systematic and detailed analysis of the role of CVD in this field. Other applications discussed include the coating of tools, bearings and other war and corrosion resistant products, including those used in the automobile, aerospace, and machine tool industries. The key benefits to CVD technology, as laid out in the 2nd Edition of the Handbook of Chemical Vapor Deposition is that it is possible to coat almost any shape product of almost any size that it can be used to produce fibers, monoliths, foams, and powders and that the process is relatively uncomplicated and flexible. Contents: Fundamentals of Chemical Vapor Deposition The Chemistry of CVD Metallo-Organic CVD (MOCVD) CVD Process and Equipment The CVD of Metals Allotropes of Carbon Non-Metallic Elements Ceramic Materials: Carbides Ceramic Materials: Nitrides Ceramic Materials: Oxides. Application Specific Topics: Electronic Applications Semiconductors Electronic Applications Conductors, Insulators, and Diffusion Barriers Optoelectronic and Ferroelectric Applications Optical Applications Wear-and Corrosion-Resistant Applications Cutting-Tool Applications Fiber, Powder, and Monolithic Applications.

Full Product Details

Author:   Hugh O. Pierson (Sandia National Laboratories (retired))
Publisher:   William Andrew Publishing
Imprint:   William Andrew Publishing
Edition:   2nd edition
Dimensions:   Width: 15.20cm , Height: 2.80cm , Length: 22.90cm
Weight:   0.970kg
ISBN:  

9780815514329


ISBN 10:   0815514328
Pages:   506
Publication Date:   01 September 1999
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   Active
Availability:   In Print   Availability explained
This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us.

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...presents an objective and systematic assessment. --High Tech Ceramics News


.presents an objective and systematic assessment. - High Tech Ceramics News


Author Information

Hugh Pierson is a private consultant in Chemical Vapor Deposition. He was the head of the Deposition

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