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OverviewTurn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications. Full Product DetailsAuthor: Paul H Holloway (University of Florida, Gainesville, Florida, USA) , Gary E McGuire , Hugh O PiersonPublisher: William Andrew Publishing Imprint: William Andrew Publishing ISBN: 9781282002593ISBN 10: 1282002597 Pages: 926 Publication Date: 01 January 1999 Audience: General/trade , General Format: Electronic book text Publisher's Status: Active Availability: In stock  We have confirmation that this item is in stock with the supplier. It will be ordered in for you and dispatched immediately. Table of ContentsReviewsAuthor InformationTab Content 6Author Website:Countries AvailableAll regions |
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