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OverviewFull Product DetailsAuthor: Xu Ma , Gonzalo R. ArcePublisher: John Wiley & Sons Inc Imprint: John Wiley & Sons Inc Dimensions: Width: 16.00cm , Height: 1.80cm , Length: 24.10cm Weight: 0.508kg ISBN: 9780470596975ISBN 10: 047059697 Pages: 256 Publication Date: 06 August 2010 Audience: Professional and scholarly , Professional & Vocational Format: Hardback Publisher's Status: Active Availability: Out of stock  The supplier is temporarily out of stock of this item. It will be ordered for you on backorder and shipped when it becomes available. Table of ContentsReviewsComputational lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in these fields. (Consumer Electronics Net, 15 March 2011) Author InformationDr. Xu Ma received a PhD in electrical and computer engineering from the University of Delaware. He is now with the Electrical Engineering and Computer Science Department at the University of California at Berkeley. Dr. Ma's research interests include computational imaging, signal processing, and computational lithography. Dr. Gonzalo R. Arce received a PhD degree in electrical engineering from Purdue University. He is the Charles Black Evans Distinguished Professor of Electrical and Computer Engineering at the University of Delaware and holds the Fulbright-Nokia Distinguished Chair in Information and Communications Technologies. Dr. Arce's fields of interest include nonlinear and statistical signal processing, digital printing, and computational imaging. He is a Fellow of the IEEE for his contributions to the theory and applications of nonlinear signal processing. Tab Content 6Author Website:Countries AvailableAll regions |
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