Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications. Materials Science and Process Technology Series.
Author:   John E Schmitz
Publisher:   William Andrew
ISBN:  

9781282013506


Pages:   235
Publication Date:   01 January 1992
Format:   Electronic book text
Availability:   In stock   Availability explained
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Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications. Materials Science and Process Technology Series.


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Author:   John E Schmitz
Publisher:   William Andrew
Imprint:   William Andrew
ISBN:  

9781282013506


ISBN 10:   1282013505
Pages:   235
Publication Date:   01 January 1992
Audience:   General/trade ,  General
Format:   Electronic book text
Publisher's Status:   Active
Availability:   In stock   Availability explained
We have confirmation that this item is in stock with the supplier. It will be ordered in for you and dispatched immediately.

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