Free Delivery Over $100
|
|
|||
|
||||
OverviewThe Metal-Oxide Semiconductor Field-Effect Transistor (MOSFET) is a key component in modern microelectronics. During the last decade, device physicists, researchers and engineers have been continuously faced with new elements making the task of MOSFET characterization increasingly crucial, as well as more difficult. The progressive miniaturization of devices has caused several phenomena to emerge and modify the performance of scaled-down MOSFETs. Localized degradation induced by hot carrier injection and Random Telegraph Signal (RTS) noise generated by individual traps are examples. It was thus unavoidable to develop new models and new characterization methods, or at least adapt the existing ones to cope with the special nature of these new phenomena. This study deals with techniques which show high potential for characterization of submicron devices. Focus is placed upon the adaptation of such methods to resolve measurement problems relevant to VLSI devices and new materials, especially Silicon-on-Insulator (SOI). The book was written to provide help to device engineers and researchers to enable them cope with the challenges they face. Without adequate device characterization, new physical phenomena and new types of defects or damage may not be well identified or dealt with, leading to an undoubted obstruction of the device development cycle. Full Product DetailsAuthor: Hisham HaddaraPublisher: Springer Imprint: Springer Edition: 1995 ed. Volume: 352 Dimensions: Width: 15.50cm , Height: 1.50cm , Length: 23.50cm Weight: 1.170kg ISBN: 9780792396956ISBN 10: 0792396952 Pages: 232 Publication Date: 31 January 1996 Audience: College/higher education , Professional and scholarly , Postgraduate, Research & Scholarly , Professional & Vocational Format: Hardback Publisher's Status: Active Availability: In Print  This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us. Table of Contents1 Static Measurements and Parameter Extraction.- 1.1 Introduction.- 1.2 Modeling of MOSFET DC Characteristics.- 1.3 MOSFET Parameter Extraction Methods.- 1.4 Measuring Techniques.- 1.5 Summary and Conclusion.- 2 Small Signal Characterization of VLSI MOSFETs.- 2.1 Introduction.- 2.2 Small Signal AC Model.- 2.3 Channel Frequency Response of MOSFETs.- 2.4 The Split Admittance Technique.- 2.5 Dynamic Transconductance.- 3 Charge Pumping.- 3.1 Introduction.- 3.2 Early Experiments and Basic Principle of CP Measurement.- 3.3 Interface State Generation-Recombination Kinetics.- 3.4 Experimental Techniques.- 3.5 Applications of Charge Pumping.- 3.6 Conclusion.- 4 Deep Level Transient Spectroscopy.- 4.1 Introduction.- 4.2 Generation, Recombination and Trapping Statistics.- 4.3 MOSFET Current Transient Spectroscopy.- 4.4 Signal Analysis.- 4.5 Depletion MOSFET Current Transient Spectroscopy.- 4.6 MOSFET Current DLTS Measurement System.- 5 Individual Interface Traps and Telegraph Noise.- 5.1 Introduction.- 5.2 Observation of Single Carrier Trapping.- 5.3 Experimental Properties of Individual Interface Traps.- 5.4 Interpretation and Modeling.- 5.5 Conclusion.- 6 Characterization of SOI MOSFETs.- 6.1 Introduction.- 6.2 Interest of MOS-SOI Technology.- 6.3 Synthesis of SOI Structures.- 6.4 Wafer Screening by ?-MOSFET Technique.- 6.5 Capacitance and Conductance Techniques.- 6.6 SOI-MOSFETs: Basic Operation and Typical Characteristics.- 6.7 Profiling the Vertical Inhomogeneities.- 6.8 Charge Pumping Technique.- 6.9 Low Frequency Noise.- 6.10 Drain Current Transient Technique.- 6.11 Concluding Remarks.- 7 Modern Analog IC Characterization Techniques.- 7.1 Introduction.- 7.2 Random Mismatch in MOS Transistors.- 7.3 The Extraction of BJT Base Spreading Resistance.- 7.4 MismatchCharacterization of BJT for Statistical CAD.- 7.5 Test Structure for Resistance Matching Properties.- 7.6 MOS Capacitance Technique.ReviewsAuthor InformationTab Content 6Author Website:Countries AvailableAll regions |
||||
