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OverviewThe worldwide semiconductor community faces increasingly difficult challenges as it moves into the manufacturing of chips with feature sizes approaching 100 nm. Some of the challenges are materials-related, such as transistors with high-k dielectrics and on-chip interconnects made from copper and low-k dielectrics. The magnitude of these challenges demands special attention from those in the metrology and analytical measurements community. Characterization and metrology are key enablers for developing semiconductor process technology and in improving manufacturing.This book summarizes major issues and gives critical reviews of important measurement techniques that are crucial to continue the advances in semiconductor technology. It covers major aspects of the process technology and most characterization techniques for silicon research, including development, manufacturing, and diagnostics.It provides a concise and effective portrayal of industry characterization needs and some of the problems that must be addressed by industry, academia, and government to continue the dramatic progress in semiconductor technology. It also provides a basis for stimulating practical perspectives and new ideas for research and development. Full Product DetailsAuthor: David G. Seiler , Alain C. Diebold , Thomas J. Shaffner , Robert McDonaldPublisher: American Institute of Physics Imprint: American Institute of Physics Edition: 2001 ed. Volume: v. 550 Dimensions: Width: 21.10cm , Height: 4.30cm , Length: 23.00cm Weight: 1.940kg ISBN: 9781563969676ISBN 10: 156396967 Pages: 723 Publication Date: 01 March 2001 Audience: Professional and scholarly , Professional & Vocational Format: Mixed media product Publisher's Status: Active Availability: In Print  This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us. Table of ContentsReviewsAuthor InformationTab Content 6Author Website:Countries AvailableAll regions |
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