Advances in Chemical Mechanical Planarization (CMP)
Author:   Babu Suryadevara (Clarkson University, Potsdam, NY, USA)
Publisher:   Elsevier Science Publishing Co Inc
Edition:   2nd edition
ISBN:  

9780128217917


Pages:   648
Publication Date:   16 September 2021
Format:   Paperback
Availability:   Manufactured on demand   Availability explained
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Advances in Chemical Mechanical Planarization (CMP)


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Author:   Babu Suryadevara (Clarkson University, Potsdam, NY, USA)
Publisher:   Elsevier Science Publishing Co Inc
Imprint:   Woodhead Publishing
Edition:   2nd edition
Weight:   1.000kg
ISBN:  

9780128217917


ISBN 10:   012821791
Pages:   648
Publication Date:   16 September 2021
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Paperback
Publisher's Status:   Active
Availability:   Manufactured on demand   Availability explained
We will order this item for you from a manufactured on demand supplier.

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Suryadevara Babu is distinguished professor and former director of the Center for Advanced Materials Processing (CAMP) at Clarkson University, NY, USA. His research interests include CMP of metal and dielectric films, CMP for shallow-trench isolation, particle-free solutions for CMP, and post-CMP cleaning.

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